Coatings

ABSTRACT

The present invention provides an electronic or electrical device or component thereof comprising a cross-linked polymeric coating on a surface of the electronic or electrical device or component thereof; wherein the cross-linked polymeric coating is obtainable by exposing the electronic or electrical device or component thereof to a plasma comprising a monomer compound and a crosslinking reagent for a period of time sufficient to allow formation of the cross-linked polymeric coating on a surface thereof, wherein the monomer compound has the following formula: where R 1 , R 2  and R 4  are each independently selected from hydrogen, optionally substituted branched or straight chain C 1 -C 6  alkyl or halo alkyl or aryl optionally substituted by halo, and R 3  is selected from: or where each X is independently selected from hydrogen, a halogen, optionally substituted branched or straight chain C 1 -C 6  alkyl, halo alkyl or aryl optionally substituted by halo; and n 1  is an integer from to 27; and wherein the crosslinking reagent comprises two or more unsaturated bonds attached by means of one or more linker moieties and has a boiling point at standard pressure of less than 500° C.

FIELD OF THE INVENTION

This invention relates to protective coatings. Specifically, the presentinvention relates to protective coatings for electronic or electricaldevices and components thereof, and methods of forming such coatings.The coatings can protect by being hydrophobic and so resist the ingressof water-based liquid into electronic devices, or they can protect byforming a barrier coating and so provide electrical resistance betweenthe electrical parts of the phone and water based liquid.

BACKGROUND OF THE INVENTION

Monounsaturated monomers are used to make barrier coatings using plasmapolymerisation processes (see co-pending application).

The perfluoroalkyl chain monomers are also used for generatinghydrophobic surfaces from pulsed plasma deposition processes (see WO9858117 A1).

The power of the plasma initiated polymerisation affects the nature ofthe polymer produced. The higher average energy inputs of continuouswave plasmas lead to more fragmentation of the monomer, and so thepolymer loses structural properties of the monomer. In the case of1H,1H,2H,2H-perfluorodecyl acrylate (PFAC8), there's less retention ofthe perfluoroalkyl chain and the contact angle of the surface coating iscompromised. Higher plasma energies also lead to more crosslinking. Forthe lower average energy inputs of pulsed plasmas, there's betterretention of monomer structure and less crosslinking. The greaterretention of the perfluoro chain under low energy, pulsed plasmaconditions leads to best levels of contact angles for the surfacecoating.

When the perfluoroalkyl chains have eight or more fluorinated carbons(long chain), the polymer made from the monomer has a crystallinestructure. When the perfluoroalkyl chains have less than eightfluorinated carbons, the resulting polymer is amorphous and so can beunstable in the presence of water (see “Molecular Aggregation Structureand Surface Properties of Poly(fluoroalkyl acrylate) Thin Films,Marcomolecules, 2005, vol 38, p5699-5705)

When long chain perfluoroalkyl polymers are produced by high averagepower (continuous wave or CW) or low average power (pulsed wave or PW)plasmas, then because of the crystalline structure of the long chains,the polymers are non-stick to the touch and stable in the presence ofwater. However, the feel and water stability of shorter chain polymercoatings is affected by the plasma power levels used. For example, whenPFAC6 (1H,1H,2H,2H-perfluorooctyl acrylate) is polymerised in low powerplasma conditions, the resulting polymer coating can have severaldisadvantages. For example the coating can cause water drops to spreadout a little (slump), be marked by the presence of a water drop on itssurface, have a tacky feel, or can be easily smeared (for example onsubstrates of silicon wafer and ABS plastic).

By increasing the power of the plasma used for polymerisation, thepolymer becomes more crosslinked and becomes more resistant to smearing.However, increasing the power has the concomitant effect of decreasingthe water contact angle through more monomer fragmentation (as describedabove). FIG. 1 shows the effect of increasing the power to monomer flowratio for CW plasmas in a 125 litre chamber: at a ratio of 4 W/μl/min,the water contact angle is ˜85-95 degrees and the coating is tack-free.However, as the ratio drops, the contact angle increases and theoccurrence of tacky/smudgy coatings increases too. FIG. 2 shows the sameeffect for pulsed plasma conditions. These results show that the processwindow for producing tack and smudge-free coatings have a limited plasmaprocessing range and the final coating has a compromised water contactangle.

Accordingly, it is an aim to solve one or more of the above-mentionedproblems with the prior art coatings.

STATEMENT OF INVENTION

An aspect of the present invention provides an electronic or electricaldevice or component thereof comprising a protective cross-linkedpolymeric coating on a surface of the electronic or electrical device orcomponent thereof;

wherein the protective cross-linked polymeric coating is obtainable byexposing the electronic or electrical device or component thereof to aplasma comprising a monomer compound and a crosslinking reagent for aperiod of time sufficient to allow formation of the protectivecross-linked polymeric coating on a surface thereof,

wherein the monomer compound has the following formula:

where R₁, R₂ and R₄ are each independently selected from hydrogen,optionally substituted branched or straight chain C₁-C₆ alkyl or haloalkyl or aryl optionally substituted by halo, and R₃ is selected from:

where each X is independently selected from hydrogen, a halogen,optionally substituted branched or straight chain C₁-C₆ alkyl, haloalkyl or aryl optionally substituted by halo; and n₁ is an integer from1 to 27; and wherein the crosslinking reagent comprises two or moreunsaturated bonds attached by means of one or more linker moieties andhas a boiling point of less than 500° C. at standard pressure.

High levels of polymer crosslinking (formerly only achievable with highaverage power continuous wave plasmas) can be achieved by adding acrosslinking molecule to the monomer to produce a cross-linkedco-polymer. This has the advantage of increasing the plasma processingrange so stable coatings can now be produced in low average energy pulseplasma conditions.

The high degree of retention of the hydrophobic monomer structures fromthe low energy pulsed plasma gives coatings of the co-polymer a goodhydrophobic coating (as evidenced by water contact angles) and a coatingthat is not sticky or smeary to the touch. Thus, these properties makeit suitable for the coating of electronic devices to prevent the ingressof water-based liquids from accidental damage. Such coatings typicallyhave a thickness between 1 and 100 nm, preferably 1 and 50 nm.

The coating may be described as a liquid repellant layer, typically awater repellant layer. The coating may repel water, an aqueous liquidsuch as rainwater, or oil.

Alternatively, or in addition to providing a liquid repellent layer, thecoating may be a physical barrier layer.

The coating may be a physical barrier i.e. it provides a physicalbarrier to mass and electron transport.

The physical barrier layer restricts diffusion of water, oxygen andions. When the coating is a physical barrier it typically has athickness of greater than 50 nm.

The coating is a protective layer i.e. it prevents damage by contactwith water or other liquids. The coating may provide is protectivefunctionality by forming a liquid repellent layer and/or a physicalbarrier layer.

The coating is preferably substantially pin-hole free to enable it toprovide a physical barrier. Preferably ΔZ/d<0.15, where ΔZ is theaverage height variation on an AFM line scan in nm (as shown in FIG. 3)and d is coating thickness in nm.

The value of ΔZ/d tells us to what extent defects/voids on the surfaceof the coating extend into the coating, i.e. the percentage value of thedepth of defect over total coating thickness. For example, ΔZ/d=0.15means that the voids on the surface only extend down to 15% of thecoating thickness. A coating with a ΔZ/d<0.15 is defined herein as beingsubstantially pinhole free. If voids are bigger than this, the desiredfunctionality is unlikely to be achieved.

The coating is preferably conformal, which means that it takes the 3Dshape of the electronic or electrical device or component thereof andcovers substantially an entire surface of the device. This has theadvantage of ensuring that the coating has sufficient thickness to giveoptimal functionality over an entire surface of the device or component.The meaning of the term “covers substantially an entire surface” willdepend to some extent on the type of surface to be covered. For example,for some components, it may be necessary for there to be completecoverage of the surface in order for the component to function aftersubmersion in water. However, for other components or housings, smallgaps in coverage may be tolerated.

The coating may have a thickness of 50 to 10,000 nm, optionally 50 to8000 nm, 100 to 5000 nm, preferably 250 nm-5000 nm, most preferably 250nm-2000 nm.

The coating may be electrically insulating and be sufficiently compliantthat electrical connectors can be joined to the electronic or electricaldevice or component thereof and an electrical connection made betweenthe electrical connectors and electronic or electrical device orcomponent thereof without the requirement to first remove the coating.In this case, the force exerted by the electrical connector on thecoating is sufficient to alter the structure of or even break throughthe coating local to the electrical connector, allowing the electricalconnection to be made. Electrical connectors can typically be joined tothe electronic or electrical device or component in this way for coatingthicknesses of under 5000 nm, and for high performance coatings below2000 nm.

The electronic or electrical device or component thereof can typicallywithstand immersion in up to 1 m of water for over 30 minutes withoutfailure or corrosion whilst power applied to the electronic orelectrical device or component. The effectiveness of the coating can bedetermined by measuring its electrical resistance at a fixed voltagewhen submerged in water for a set time period; for example, applying avoltage of 8V to the coating of a device which is submerged in water for13 minutes. Coatings having a resistance value of 1×10⁷ Ohms or higherin this test are effective barrier coatings and the coated electronic orelectrical device or component thereof will pass successfully an IPX7test. The IPX7 test is the Ingress Protection Marking which classifiesand rates the degree of protection provided against water. In the IPX7test for phones, the device is immersed in water under definedconditions of pressure and time (up to 1 m of submersion) for a durationof 30 minutes. The device has to be powered on during testing andfunctional after 24 hrs.

In one embodiment, the coating is electrically insulating and has athickness of less than 1 micron and wherein a force of 5-20 g applied tothe coating using a round probe with 1 mm diameter allows an electricalconnection to be made with the electronic or electrical device orcomponent thereof in the local area where the force has been applied.

In another embodiment, the coating is electrically insulating and has athickness of 1-2.5 microns and wherein a force of 20-100 g applied tothe coating using a round probe with 1 mm diameter allows an electricalconnection to be made in the local area of the coating where the forcehas been applied.

The coating may have a higher density than that of the correspondingmonomer from which it is formed. For example, the increase in densitymay be at least 0.1 g/cm³ The increase in density is explained by thehighly crosslinked coating. The high density of the coating improves thebarrier properties of the coating.

The coating may form a surface defined by a static water contact angle(WCA) of at least 70°. A coating with a WCA of at least 90° is a liquidrepellent, typically a water repellent layer. For fluorinated polymers,the coating may have a static water contact angle of at least 100°. Thecontact angle of a liquid on a solid substrate gives an indication ofthe surface energy which in turn illustrates the substrate's liquidrepellence. Contact angles were measured on a VCA Optima contact angleanalyser, using 3 μl droplets of deionised water at room temperature.

Crosslinker

A basic requirement for the cross-linking reagent is the presence two ormore unsaturated bonds, for example, —C═C— or alkyne groups. Theunsaturated bonds are attached by one or more linker moieties. Thelinker moiety is not especially limited provided it joins together thetwo or more unsaturated bonds. The cross-linking reagent must have aboiling point of less than 500° C., preferably from −10 to 300° C.,optionally 180 to 270° C., most preferably 205 to 260° C. at standardpressure. It is a preference, but not a requirement, that thecross-linking reagent is not unduly hazardous for use in plasmaprocessing, that is to say it can be used in a production environmentwhere low levels of vapour do not present any significant health andsafety issues (e.g. strongly oxidising, explosive, toxic, or has anoffensive odour (e.g. stench reagent)). The crosslinking reagentpreferably has one of the following structures:

where Y₁, Y₂, Y₃, Y₄, Y₅, Y₆, Y₇ and Y₈ are each independently selectedfrom hydrogen, optionally substituted cyclic, branched or straight chainC₁-C₆ alkyl or aryl; and L is a linker moiety.

Most preferably L has the following formula:

where each Y₉ is independently selected from, a bond, —O—, —O—C(O)—,—C(O)—O—, —Y₁₁—O—C(O)—, —C(O)—O—Y₁₁—, —OY₁₁—, and —Y₁₁O—, where Y₁₁ isan optionally substituted cyclic, branched or straight chain C₁-C₈alkylene; and

Y₁₀ is selected from optionally substituted cyclic, branched or straightchain C₁-C₈ alkylene and a siloxane containing group.

In one most preferred embodiment Y₁₀ has the following formula:

wherein each Y₁₂ and Y₁₃ is independently selected from H, halo,optionally substituted cyclic, branched or straight chain C₁-C₈ alkyl,or —OY₁₄, where Y₁₄ is selected from optionally substituted branched orstraight chain C₁-C₈ alkyl or alkenyl, and n is an integer from 1 to 10.

Optionally, each Y₁₂ is H and each Y₁₃ is H, i.e. Y₁₀, is a linearalkylene chain. For this embodiment Y₉ is preferably a vinyl ester orvinyl ether group.

Optionally, each Y₁₂ is fluoro and each Y₁₃ is fluoro, i.e. Y₁₀ is alinear perfluoroalkylene chain.

Typically, n is from 4 to 6.

In another embodiment Y₁₀ has the following formula:

wherein each Y₁₅ is independently selected from optionally substitutedbranched or straight chain C₁-C₆ alkyl.

In one embodiment each Y₁₅ is methyl, and each Y₉ is a bond.

In a further embodiment Y₁₀ has the following formula:

wherein Y₁₆ to Y₁₉ are each independently selected from H and optionallysubstituted branched or straight chain C₁-C₈ alkyl or alkenyl. Apreferred alkenyl group is vinyl. Optionally Y₁₈ is H or vinyl, and Y₁₆,Y₁₇ and Y₁₉ are each H. In one embodiment each of Y₁₆ to Y₁₉ is H. Inanother embodiment Y₁₈ is vinyl, and Y₁₆, Y₁₇ and Y₁₉ are each H.

In preferable embodiments for compound (i), L has one of the followingstructures:

In another embodiment for compound (i) L has one of the followingstructures:

For L according structure (vii), Y₁₀ is preferably an alkylene chain ora cycloalkylene, such as those shown in structures iv) and vi) above.The alkylene chain may be a straight chain alkylene chain. When Y₁₀ is acycloalkylene, cyclohexylene is preferred, most preferably 1,4cyclohexylene.

For L according to structure (viii), Y₁₀ is preferably structure (iv),i.e. an alkylene or fluoroalkylene chain.

For L according to structure (ix), Y₁₀ is preferably cycloalkylene, suchas the cyclohexylene according to structure (vi).

For L according to structure (x), Y₁₀ is preferably structure (iv)wherein each Y₁₂ and Y₁₃ is F, i.e. a perfluoroalkylene chain.

For L according to structure (xi) or structure (xii) Y₁₀ is preferablyalkylene or cycloalkylene. Optionally the alkylene or cycloalkylene maybe substituted with one or more vinyl groups or alkenyl ether groups,preferably one or more vinyl ether groups.

When each Y₉ is a bond, each Y₁₀ may be any of structures (iv), (v) and(vi). Preferably Y₁₀ is a straight chain alkylene such that thecrosslinking reagent is a diene, such as a heptadiene, octadiene, ornonadiene, most preferably 1,7-octadiene.

When each Y₉ is O, each Y₁₀ is preferably a branched or straight chainC₁-C₆ alkylene, preferably a straight chain alkylene, most preferably aC₄ straight chain alkylene, i.e the crosslinking reagent is1,4-butanediol divinyl ether

It will be understood that each Y₉ group can be combined with any otherY₉ group and Y₁₀ group to form the crosslinking reagent.

The skilled person will be aware of possible substituents for each ofthe cyclic, branched or straight chain C₁-C₈ alkylene groups mentionedabove. The alkylene groups may be substituted at one or more positionsby a suitable chemical group. Halo substituents are preferred, withfluoro substituents most preferred. Each C₁-C₈ alkylene group may be aC₁-C₃, C₂-C₆, or C₆-C₈ alkylene group.

Particularly preferred embodiments of the crosslinker have alkyl chainsfor Y₁₀ and vinyl ester or vinyl ether groups on either side.

A particularly preferred cross-linking reagent is divinyl adipate. (adivinyl ester)

Another preferred cross-linking reagent is 1,4-butanediol divinyl ether(a divinyl ether)

For the most preferred embodiments the crosslinking reagent is selectedfrom Divinyl Adipate (DVA), 1,4 Butanediol divinyl ether (BDVE),1,4Cyclohexanedimethanol divinyl ether (CDDE), 1,7-Octadiene (17OD),1,2,4-Trivinylcyclohexane (TVCH), 1,3-Divinyltetramethyldisiloxane(DVTMDS), Diallyl 1,4-cyclohexanedicarboxylate (DCHD),1,6-Divinylperfluorohexane (DVPFH), 1H,1H,6H,6H-Perfluorohexanedioldiacrylate (PFHDA) and glyoxal bis (diallyl acetal) (GBDA).

For the alkyne crosslinking reagents according to compound (ii), L ispreferably selected from a branched or straight chain C₁-C₈ alkylene oran ether group. L may be a C₃, C₄, C₅, or C₆ alkylene, preferably astraight chain alkylene. Chemical structures for the particularlypreferred crosslinking reagents are set out below in Table 1:

TABLE 1 Divinyl Adipate (DVA)

1,4 Butanediol divinyl ether (BDVE)

1,4 Cyclohexanedimethanol divinyl ether (CDDE)

1,7-Octadiene (17OD)

1,2,4-Trivinylcyclohexane (TVCH)

1,3- Divinyltetramethyldisiloxane (DVTMDS)

Diallyl 1,4- cyclohexanedicarboxylate (DCHD)

1,6-Divinylperfluorohexane (DVPFH)

1H,1H,6H,6H- Perfluorohexanediol diacrylate (PFHDA)

GBDA

1,6-heptadiyne

1,7-heptadiyne

1,8-heptadiyne

Propargyl ether

Monomer Compound

The monomer compound has the following formula:

where R₁, R₂ and R₄ are each independently selected from hydrogen,optionally substituted branched or straight chain C₁-C₆ alkyl or haloalkyl or aryl optionally substituted by halo, and R₃ is selected from:

where each X is independently selected from hydrogen, a halogen,optionally substituted branched or straight chain C₁-C₆ alkyl, haloalkyl or aryl optionally substituted by halo; and n₁ is an integer from1 to 27. Preferably, n₁ is from 1 to 12. Optionally n₁ is from 4 to 12,optionally 6 to 8.

In a preferred embodiment R₃ is selected from:

where m₁ is an integer from 0 to 13 and each X is independently selectedfrom hydrogen, a halogen, optionally substituted branched or straightchain C₁-C₆ alkyl, halo alkyl or aryl optionally substituted by halo;and m2 is an integer from 2 to 14;

In a particularly preferred embodiment the monomer is a compound offormula I(a):

wherein each of R₁, R₂, R₄, and R₅ to R₁₀ is independently selected fromhydrogen or an optionally substituted C₁-C₆ branched or straight chainalkyl group; each X is independently selected from hydrogen or halogen;a is from 0-10; b is from 2 to 14; and c is 0 or 1;

; or

the monomer is a compound of formula I(b):

wherein each of R₁, R₂, R₄, and R₅ to R₁₀ is independently selected fromhydrogen or an optionally substituted C₁-C₆ branched or straight chainalkyl group; each X is independently selected from hydrogen or halogen;a is from 0-10; b is from 2 to 14; and c is 0 or 1.

The halogen may be chlorine or bromine, but is preferably fluorine forcompliance with RoHS regulations (Restriction of Hazardous Substances).

a is from 0 to 10, preferably from 0 to 6, optionally 2 to 4, mostpreferably 0 or 1. b is from 2 to 14, optionally from 2 to 10,preferably 3 to 7.

Each of R₁, R₂, R₄, and R₅ to R₁₀ is independently selected fromhydrogen or a C₁-C₆ branched or straight chain alkyl group. The alkylgroup may be substituted or unsubstituted, saturated or unsaturated.When the alkyl group is substituted, the location or type of thesubstituent is not especially limited provided the resultant polymerprovides an appropriate liquid repellent and/or barrier layer. Theskilled person would be aware of suitable substituents. If the alkylgroup is substituted, a preferred substituent is halo, i.e. any of R₁,R₂, R₄, and R₅ to R₁₀ may be haloalkyl, preferably fluoro alkyl. Otherpossible substituents may be hydroxyl or amine groups. If the alkylgroup is unsaturated it may comprise one or more alkene or alkynegroups.

Each of R₁, R₂, R₄, and R₅ to R₁₀ may be independently selected fromhydrogen, methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl,tert-butyl, sec-butyl, n-pentyl, neopentyl, n-hexyl, isohexyl, and3-methylpentyl.

In a preferred embodiment each of R₁, R₂, R₄ and R₁₀ is independentlyselected from hydrogen or methyl.

In a preferred embodiment, a and c are each independently 0 or 1; and bis from 3 to 7.

In one preferred embodiment each X is H. In an alternative preferredembodiment each X is F.

Optionally R₁ and R₂ are both hydrogen.

Optionally R₄ is hydrogen or methyl. Preferably R₁ and R₂ are bothhydrogen and R₄ is hydrogen or methyl.

Optionally R₉ is hydrogen and R₁₀ is branched or straight chain C₁-C₆alkyl group. In a preferred embodiment R₁₀ is methyl.

In one embodiment each of R₅ to R₈ is hydrogen.

In one embodiment each of R₁, R₂, R₄ and R₁₀ is hydrogen, each X is H,a=0 and c=0.

In a particularly preferred embodiment the monomer compound has thefollowing formula:

-   -   where n is from 2 to 10.

In another preferred embodiment the monomer compound has the followingformula:

-   -   where n is from 2 to 10.

The monomer compound may be selected from 1H,1H,2H,2H-perfluorohexylacrylate (PFAC4), 1H,1H,2H,2H-perfluorooctyl acrylate (PFAC6),1H,1H,2H,2H-perfluorodecyl acrylate (PFAC8) and1H,1H,2H,2H-perfluorododecyl acrylate (PFAC10).

The monomer compound may be selected from 1H,1H,2H,2H-pefluorohexylmethacrylate (PFMAC4), 1H,1H,2H,2H-perfluorooctyl methacrylate (PFMAC6)and 1H,1H,2H,2H-perfluorodecyl methacrylate (PFMAC8).

The monomer compound of formula I(a) may have the following formula:

-   -   wherein a and c are each independently 0 or 1, b=3-7 and n is 4        to 10, where n=a+b+c+1.

The monomer ccompound of formula I(a) may have the following formula:

-   -   where n is 2 to 12.

The monomer compound may be selected from ethyl hexyl acrylate, hexylacrylate, decyl acrylate, lauryl dodecyl acrylate and iso decylacrylate.

The monomer may have the following formula:

-   -   where n is from 4 to 14.

The monomer may have the following formula:

-   -   where n is from 4 to 14.

In an additional aspect, the present invention provides a method fortreating an electronic device or component thereof comprising:

exposing the electronic or electrical device or component thereof to aplasma comprising a monomer compound and a crosslinking reagent for aperiod of time sufficient to allow a protective cross-linked polymericcoating to form on a surface of the electronic or electrical device orcomponent thereof;

wherein the monomer compound has the following formula:

where R₁, R₂ and R₄ are each independently selected from hydrogen,optionally substituted branched or straight chain C₁-C₆ alkyl or haloalkyl or aryl optionally substituted by halo, and R₃ is selected from:

where each X is independently selected from hydrogen, optionallysubstituted branched or straight chain C₁-C₆ alkyl, halo alkyl or aryloptionally substituted by halo; and n₁ is an integer from 1 to 27; andwherein the crosslinking reagent comprises two or more unsaturated bondsand has a boiling point of less than 500° C. at standard pressure.

The monomer compound and the crosslinking reagent utilised in the methodare described in further detail above.

Typically the electronic or electrical device or component thereof isplaced in a plasma deposition chamber, a glow discharge is ignitedwithin said chamber, and a voltage applied as a pulsed field.

Preferably the applied voltage is at a power of from 30 to 800W.Optionally the voltage is pulsed in a sequence in which the ratio of thetime on/time off is in the range of from 0.001 to 1, optionally 0.002 to0.5. For example, time on may be 10-500 μs, preferably 35-45 μs, or30-40 μs, such as about 36 μs and time off may be from 0.1 to 30 ms,preferably 0.1 to 20 ms, optionally from 5 to 15 ms, for example 6 ms.Time on may be 35 μs, 40 μs, 45 μs. Time off may be 0.1, 1, 2, 3, 6, 8,10, 15, 20, 25 or 30 ms.

The term pulsed may mean that the plasma cycles between a state of no(or substantially no) plasma emission (off-state) and a state where aparticular amount of plasma is emitted (on-state). Alternatively, pulsedmay mean that there is continuous emission of plasma but that the amountof plasma cycles between an upper limit (on-state) and lower limit(off-state).

In a further embodiment, the invention resides in a method of forming acoating on an electronic or electrical device or component thereof asdefined above, the method comprising: exposing said substrate in achamber to a plasma comprising a monomer compound, preferably acontinuous plasma, for a sufficient period of time to allow a protectivepolymeric coating to form on the substrate, wherein during exposure ofthe substrate the continuous plasma has a power density of at least 2W/litre, preferably 20 W/litre.

Optionally the voltage is applied as a pulsed field for a period of from30 seconds to 90 minutes. Optionally the voltage is applied as a pulsedfield for from 5 to 60 minutes. Optionally in a preliminary step, acontinuous power plasma is applied to the electronic or electricaldevice or component thereof. The preliminary step may be conducted inthe presence of an inert gas.

Before the crosslinker and/or the monomer compound enter the depositionchamber each may be in the form of a gas, liquid or a solid (for examplea powder) at room temperature. However, it is the preferred that thecrosslinking reagent and the monomer compound are both liquid at roomtemperature, and most preferably that the monomer and crosslinkerliquids are miscible.

The monomer compound and/or the crosslinker will suitably be in agaseous state in the plasma. The plasma may simply comprise a vapour ofthe monomer compound and the crosslinker. Such a vapour may be formedin-situ, with the compounds being introduced into the chamber in liquidform. The monomer may also be combined with a carrier gas, inparticular, an inert gas such as helium or argon.

In preferred embodiments, the monomer and/or the crosslinker may bedelivered into the chamber by way of an aerosol device such as anebuliser or the like, as described for example in WO2003/097245 andWO03/101621, the content of which is incorporated herein by reference.In such an arrangement a carrier gas may not be required, whichadvantageously assists in achieving high flow rates.

In one embodiment the monomer compound and/or the crosslinking reagentare in gaseous form and are fed into the plasma at a rate of from10-5000 mg/minute depending on chamber volume, whilst the pulsed voltageis applied.

Optionally the plasma is created with an average power of from 0.001 to40 W/litre.

The crosslinker may be miscible with the monomer and so introducedtogether or separately into the plasma chamber. Or the crosslinker maybe immiscible with the monomer and introduced separately into the plasmachamber. In this context, the term “miscible” means that the crosslinkeris soluble in the monomer, and when mixed they form a solution ofuniform composition. The term “immiscible” is used to mean that thecrosslinker is only partly soluble or insoluble in the monomer, and soeither forms an emulsion or separates out into two layers.

The crosslinking reagent is preferably present in an amount of from 10to 60 (v/v) %, optionally 20 to 40 (v/v) %, optionally 25 to 30 (v/v) %,optionally 30 to 50 (v/v) % of the total volume of monomer compound andcrosslinking reagent, depending on the specific crosslinker. The skilledperson would understand that the amount will vary to some extentdepending on whether the coating is required to be liquid repellent orprovide a barrier to mass and electron transport. The skilled personwould understand that the (v/v) percentages are those which give astable crosslinked polymer coating and the highest water contact angle.

Electronic or Electrical Device or Component Thereof

Although the invention is of benefit in the context of a wide variety ofsubstrates, the substrate may, in all aspects of the invention,advantageously be an electronic substrate.

In some embodiments of the invention, the electronic substrate maycomprise an electronic or electrical device, i.e. any piece ofelectrical or electronic equipment. Non-limiting examples of electricaland electronic devices include communications devices such as mobilephones, smartphones and pagers, radios, and sound and audio systems suchas loudspeakers, microphones, ringers or buzzers, hearing aids, personalaudio equipment such as personal CD, tape cassette or MP3 players,televisions, DVD players including portable DVD players, videorecorders, digi and other set-top boxes such as Sky, computers andrelated components such as laptop, notebook, tablet, phablet or palmtopcomputers, personal digital assistants (PDAs), keyboards, orinstrumentation, games consoles in particular hand-held playstations andthe like, data storage devices, outdoor lighting systems or radioantenna and other forms of communication equipment.

In preferred embodiments of the invention, the substrate may comprise orconsist of an electronic component, e.g. a printed circuit board (PCB),a printed circuit board array (PCBA), a transistor, resistor, orsemi-conductor chip. The electronic component may thus be an internalcomponent of an electronic device, e.g. a mobile phone. The coatings ofthe invention are particularly valuable in preventing electrochemicalmigration in such components.

In all aspects of the invention, the precise conditions under which theprotective polymeric coating is formed in an effective manner will varydepending upon factors such as, without limitation, the nature of themonomer compound, the crosslinking reagent, the substrate, as well asthe desired properties of the coating. These conditions can bedetermined using routine methods or, preferably, using the techniquesand preferred features of the invention described herein, which work inparticular synergy with the invention.

The present invention will now be further described with reference tothe following non-limiting examples and the accompanying illustrativedrawings, of which:

FIG. 1 illustrates shows the effect of increasing the power to monomerflow ratio for CW plasmas in a 3 litre chamber in a prior art process.

FIG. 2 shows the same effect for pulsed plasma conditions.

FIG. 3 shows a tapping mode image over 10×10 μm² field of view of aspecimen example (thickness d=1230 nm) prepared according to Example 1(left hand side) and a contour line plot showing the data used forcalculation of RMS roughness (right hand side). The ΔZ value indicatedon the plot has been taken over an area of the graph that represents themajority of the coating. Peaks that lie above the ΔZ range indicatelarge particles and troughs that fall below the ΔZ range show voids orpinholes in the coating. The width of the peaks also gives an indicationof the particle size.

FIG. 4 illustrates the effect of adding the divinyl adipate crosslinkerto perfluorooctyl acrylate on water contact angle from a process on a125 Litre chamber.

FIG. 5 shows the effect of adding crosslinkers in accordance with theinvention on the electrical resistance per nm of the coatings.

FIG. 6 shows a tapping mode image of a 90 nm thick coating, prepared asdescribed in Example 3, over 2×2 μm² field of view (top left), arepresentative contour line indicating height variation (z-axis) of thecoating (top right) and a phase image indicating full substrate coverage(bottom left) ;RMS roughness of the coating is 1.65 nm and Δz/d=0.05

FIG. 7 shows a FTIR/ATR spectrum of a coating formed according toExample 5.

EXAMPLE 1 Example of Plasma Polymerising PFAC6 with No Crosslinker in a3 Litre Chamber

PFAC6 was polymerised in a 3 litre glass chamber using a continuousplasma process. In the experimental matrix, the continuous plasma wasproduced using RF power levels of 50, 100 and 200 Watts. The processpressure was run at 30, 60 and 90 mTorr and the monomer flow rate run at50, 100 and 200 microlitres of liquid per minute. The duration of theprocess was either 10 or 40 minutes. The coated substrate was siliconwafer and whether the coating was tacky or not was determined by wipingthe substrate with a finger and determining by eye if the coating hadsmeared. The results in FIG. 1 indicate that for lower CW powers, thecoating could easily be smeared (i.e. tacky), but by increasing thepower to flow ratio, the coating became resistant to smearing (i.e.non-tacky) and this is expected to be due to additional crosslinkingcaused by more monomer fragmentation. The water contact angle was alsoseen to decline with increasing power to flow ratio, and this too isindicative of more power increasing the level of monomer fragmentation.

The same 3 litre chamber was used to also look at the effect of power toflow ratios with pulsed plasma polymerisation. In these experiments, thepeak power was either 250 or 500 W. The RF power feed was pulsed with anon time of 35 microseconds and off times of 5.5 and 1 millisecond.Process pressure was either 20, 35, 60 or 80 mTorr. The monomer flow waseither 50 or 200 microlitres of liquid per minute. FIG. 2 shows that lowpower to flow conditions can generate coatings that can be smeared(tacky) and only by increasing the power could the smear be reduced.This too had a concomitant decline in water contact angle.

The results from FIGS. 1 and 2 show that plasma processing PFAC6 on itsown could only lead to smear—free coatings when the powers were highenough to decrease the other desirable property of the water contactangle This illustrates the need to add a crosslinker to prevent thecoating smearing and maintain the water contact angle.

EXAMPLE 2 Examples of Perfluoro Alkyl Acrylate Co-polymerisation withCrosslinker to Show Improvements in Electrical Resistance

Perfluorooctyl acrylate monomer was mixed with a single crosslinker fromthe following list:

VINYL ESTERS: Divinyl adipate (DVA)

VINYL ETHERS: 1,4-Butanediol divinyl ether (BDVE); 1,4Cyclohexanedimethanol divinyl ether (CDDE)

DI- or TRI-VINYLS: 1,7-Octadiene (1,7-OD); 1,2,4-Trivinylcyclohexane(TVCH);

DI VINYL with alkyl fluoro group: 1,6-divinylperfluorohexane (DVPFH)

DI VINYL with silicon group: 1,3-Divinyl tetramethyldisiloxane (DVTMDS)

DI VINYL with cyclic ring and carboxylate groups: Diallyl1,4-cyclohexanedicarboxylate (DCHC)

DI ACRYLATE: 1H1H,6H,6H-perfluorohexanediol diacrylate (PFHDA) Thecrosslinker was mixed with the PFAC6 as a percentage by volume for thefollowing percentages: 20, 40, 60, 80, and 100%.

Plasma initiated polymerisation reactions were carried out in a 3 litreglass plasma chamber. The substrates were test circuit boards. ThePFAC6/crosslinker mixture was introduced at a rate of 0.04-0.06 ul/minand the process pressure was 40 mTorr. The process plasma consisted of a1 minute continuous plasma (CW) step of 50W followed by 10-20 minutepulsed plasma (PW) step of 50W and RF power being delivered by a pulsesequence with a duty cycle of 6.9%. The coated circuit boards wereimmersed in tap water and an 8V potential was applied for 13 minutes.The final current readings, together with coating thicknessmeasurements, were used to calculate the electrical resistance per nm ofcoating. FIG. 5 below shows the effect of adding a range of crosslinkerson the electrical resistance per nm of the barrier coatings. FIG. 5clearly shows the improvement in resistance that can be gained by addingthe crosslinker to the PFAC6 monomer. Furthermore, all of thecrosslinkers tested gave non-smear/non-tacky coatings with concentrationlevels of 20% and above, with the exceptions of DVTMDS, DCHD, PFHDA andDVPFH which were non-smear at levels of 40% and above.

EXAMPLE 3 Example of Crosslinker Concentration on Water RepellentCoating

Water repellent coatings were prepared in a 125 litre volume chamberusing PFAC6 with different levels of divinyl adipate (DVA) and usinghelium as a carrier gas. The deposition process consisted of a 3 minuteCW step with 300W power and a pulsed step with 150W power and an RFpulse duty cycle of 0.018%. Silicon wafer was used as the testsubstrates and the contact angle of the coated wafer was determined byapplying a 3 ul drop of deionised wafer onto the coated wafer andmeasuring the contact angle using a VCA Optima (AST products) with imageanalysis software. The variation of contact angle with (v/v) % DVAcrosslinker is shown in FIG. 4. It was also noted that for the 10 (v/v)% DVA concentration, the water drop left a mark on the coated waferwhere it's circumference had been. This indicated that a higher level ofcrosslinker was required to give a more stable coating. Thisobservation, in combination with the results in FIG. 4, suggest anoptimum range of 20-40 (v/v) % DVA crosslinker, though this is likely tovary, typically within the range of from 10-60 (v/v) % for differentmonomers and crosslinkers and different chamber sizes.

Pulsed plasma polymerisation of perfluoro alkyl acrylate in the presenceof divinyl adipate (DVA) was carried out in a 125 litre chamber. FIG. 4shows the effect of adding different liquid volume percentages of DVAcrosslinker to perfluorooctyl acrylate on water contact angle on asilicon wafer substrate.

EXAMPLE 4 Example of AFM Measurement of Monomer/Crosslinker Co-PolymerCoating

A barrier-style coating was prepared in a 22 litre volume chamber usingPFAC6 with 10% DVA. The deposition process consisted of a 1 minute CWstep with a CW power to flow ratio of 3.9 (W/microliter/min), and apulsed step with a PW power/monomer flow ratio of 0.28(W/microlitres/min). FIG. 6 shows the representative topographical andphase contrast images were obtained from all the samples. High spatialresolution images show mainly the structures of areas between the raisedfeatures. The RMS roughness of the coating is 1.65 nm and the Δz/d=0.05.As the Δz/d value is <0.15, then this indicates that the physical layeris substantially pinhole free.

EXAMPLE 5 Example of FTIR/ATR Measurement of Monomer/CrosslinkerCo-Polymer Coating

Two barrier-style coatings were prepared in a 22 litre volume chamberusing PFAC6 only and PFAC6 with 10% DVA as described in example 4. Thedeposition process consisted of a 1 minute CW step with a CW power toflow ratio of 3.9 (W/microliter/min), and a pulsed step with a PWpower/monomer flow ratio of 0.28 (W/microlitres/min). FIG. 7 shows therepresentative FTIR/ATR spectrum obtained from both samples.

The FTIR/ATR intensity ratios of peaks attributed to stretching mode ofCF₃ and C═O groups, CF₃/C═O, of the coating is indicative of sufficientcross linking in the coating to form a physical barrier. CF₃ refers tothe terminal groups in the side chain of PFAC6.

Formation of the barrier coatings is believed to be caused by a mixtureof cross linking and controlled fragmentation of the monomers duringpolymerisation. Cross linking is believed to be predominantly via theCF2-CF3 chain, whilst fragmentation is thought to be predominantlythrough loss of the C═O group during polymerisation and to a lesserextent shortening of the CF2 chain. Cross linking effects the abundanceof —CF₃ groups in the coating and controlled fragmentation controls theamount of C═O groups in the coating. The ratio of these two functionalgroups is an indication that sufficient cross-linking and fragmentationhas taken place and can be measured by the ratio of the intensities ofthe corresponding FTIR/ATR peaks.

It has been shown that coatings with reduced CF₃/C═O ratios give higherresistance values in the electrical test, as described in Example 2,showing an improved coating performance on increased cross linking (forCF₃) and fragmentation (for C═O). If the FTIR/ATR intensity ratio of thepeaks attributed to —CF₃ stretching and C═O stretching, CF₃/C═O, is lessthan 0.6e^(−0.1n) (where n=6 for PFAC6) the resistance of the coating atthe electrical test is expected to be higher than 8 MOhms.

The peak intensity ratio CF₃/C═O the coating thickness and the finalcurrent readings during the electrical test are shown in table 2:

TABLE 2 Resistance in CF₃/C═O Thickness water at 8 V ATR peak intensity(nm) (Ohms) ratio PFAC6 1480 2.1 × 10⁷ 0.23 PFAC6 and 1450 9.2 × 10⁹0.11 10% DVA (in volume)

1. An electronic or electrical device or component thereof comprising aprotective cross-linked polymeric coating on a surface of the electronicor electrical device or component thereof; wherein the protectivecross-linked polymeric coating is obtainable by exposing the electronicor electrical device or component thereof to a plasma comprising amonomer compound and a crosslinking reagent for a period of timesufficient to allow formation of the protective cross-linked polymericcoating on a surface thereof, wherein the monomer compound has thefollowing formula:

where R₁, R₂ and R₄ are each independently selected from hydrogen,optionally substituted branched or straight chain C₁-C₆ alkyl or haloalkyl or aryl optionally substituted by halo, and R₃ is selected from:

where each X is independently selected from hydrogen, a halogen,optionally substituted branched or straight chain C₁-C₆ alkyl, haloalkyl or aryl optionally substituted by halo; and n₁ is an integer from1 to 27; and wherein the crosslinking reagent comprises two or moreunsaturated bonds attached by means of one or more linker moieties andhas a boiling point of less than 500° C. at standard pressure.
 2. Anelectronic or electrical device or component thereof according to claim1, wherein the protective cross-linked polymeric coating is a physicalbarrier to mass and electron transport.
 3. An electronic or electricaldevice or component thereof according to claim 1 or claim 2, wherein theprotective cross-linked polymeric coating forms a liquid repellentsurface defined by a static water contact angle (WCA) of at least 90°.4. An electronic or electrical device or component thereof according toany preceding claim, wherein the crosslinking reagent has one of thefollowing structures:

where Y₁, Y₂, Y₃, Y₄, Y₅, Y₆, Y₇ and Y₈ are each independently selectedfrom hydrogen, optionally substituted cyclic, branched or straight chainC₁-C₆ alkyl or aryl; and L is a linker moiety.
 5. An electronic orelectrical device or component thereof according to claim 4, wherein forcompound (i) L has the following formula:

each Y₉ is independently selected from, a bond, —O—, —O—C(O)—, —C(O)—O—,—Y₁₁—O—C(O)—, —C(O)—O—Y₁₁—, —OY₁₁—, and —Y₁₁—, where Y₁₁ is anoptionally substituted cyclic, branched or straight chain C₁-C₈alkylene; and Y₁₀ is selected from optionally substituted cyclic,branched or straight chain C₁-C₈ alkylene and a siloxane group.
 6. Anelectronic or electrical device or component thereof according to claim5, wherein for compound (i) L has one of the following structures:


7. An electronic or electrical device or component thereof according toclaim 5, wherein for compound (i) L has one of the following structures:


8. An electronic or electrical device or component thereof according toany of claims 5 to 7, wherein Y₁₀ has the following formula:

wherein each Y₁₂ and Y₁₃ is independently selected from H, halo,optionally substituted cyclic, branched or straight chain alkyl, or—OY₁₄, where Y₁₄ is selected from optionally substituted branched orstraight chain C₁-C₈ alkyl or alkenyl, and n is an integer from 1 to 10.9. An electronic or electrical device or component thereof according toclaim 8, wherein each Y₁₂ is H and each Y₁₃ is H.
 10. An electronic orelectrical device or component thereof according to claim 8, whereineach Y₁₂ is fluoro and each Y₁₃ is fluoro.
 11. An electronic orelectrical device or component thereof according to any of claims 8 to10, wherein n is from 4 to
 6. 12. An electronic or electrical device orcomponent thereof according to any of claims 5 to 7, wherein Y₁₀ has thefollowing formula:

Wherein each Y₁₅ is independently selected from optionally substitutedbranched or straight chain C₁-C₆ alkyl.
 13. An electronic or electricaldevice or component thereof according to claim 12, wherein each Y₁₅ ismethyl, and each Y₉ is a bond.
 14. An electronic or electrical device orcomponent thereof according to any of claims 5 to 7, wherein Y₁₀ has thefollowing formula:

wherein Y₁₆ to Y₁₉ are each independently selected from H and optionallysubstituted branched or straight chain C₁-C₈ alkyl or alkenyl.
 15. Anelectronic or electrical device or component thereof according to claim14, wherein Y₁₈ is H or vinylene, and Y₁₆, Y₁₇ and Y₁₉ are each H. 16.An electronic or electrical device or component thereof according to anypreceding claim wherein the crosslinking reagent is selected fromDivinyl Adipate (DVA), 1,4 Butanediol divinyl ether (BDVE), 1,4Cyclohexanedimethanol divinyl ether (CDDE), 1,7 -Octadiene (17OD),1,2,4-Trivinylcyclohexane (TVCH), 1,3-Divinyltetramethyldisiloxane(DVTMDS), Diallyl 1,4-cyclohexanedicarboxylate (DCHD),1,6-Divinylperfluorohexane (DVPFH), 1H,1H,6H,6H-Perfluorohexanedioldiacrylate (PFHDA) and glyoxal bis (diallyl acetal) (GBDA).
 17. Anelectronic or electrical device or component thereof according to claim4, wherein for compound (ii), L is selected from a branched or straightchain C₁-C₈ alkylene or an ether group.
 18. An electronic or electricaldevice or component thereof according to any preceding claim wherein themonomer is a compound of formula I(a):

wherein each of R₁, R₂, R₄, and R₅ to R₁₀ is independently selected fromhydrogen or an optionally substituted C₁-C₆ branched or straight chainalkyl group; each X is independently selected from hydrogen or halogen;a is from 0-10; b is from 2 to 14; and c is 0 or 1; ; or wherein themonomer is a compound of formula I(b):

wherein each of R₁, R₂, R₄, and R₅ to R₁₀ is independently selected fromhydrogen or an optionally substituted C₁-C₆ branched or straight chainalkyl group; each X is independently selected from hydrogen or halogen;a is from 0-10; b is from 2 to 14; and c is 0 or
 1. 19. An electronic orelectrical device or component thereof according to claim 18, whereinthe halogen is fluorine.
 20. An electronic or electrical device orcomponent thereof according to claim 18 or claim 19, wherein each of R₁,R₂, R₄, and R₅ to R₁₀ is independently selected from hydrogen, methyl,ethyl, n-propyl, isopropyl, n-butyl, isobutyl, tert-butyl, sec-butyl,n-pentyl, neopentyl, n-hexyl, isohexyl, and 3-methylpentyl.
 21. Anelectronic or electrical device or component thereof according to claim20, wherein each of R₁, R₂, R₄, and R₅ to R₁₀ is independently selectedfrom hydrogen or methyl.
 22. An electronic or electrical device orcomponent thereof according to any of claims 18 to 20, wherein a and care each independently 0 or 1; and b is from 3 to
 7. 23. An electronicor electrical device or component thereof according to any precedingclaim wherein each X is H.
 24. An electronic or electrical device orcomponent thereof according to any of claims 1 to 22, wherein each X isF.
 25. An electronic or electrical device or component thereof accordingto any of claims 18 to 24, wherein R₁ and R₂ are both hydrogen.
 26. Anelectronic or electrical device or component thereof according to any ofclaims 18 to 25, wherein R₄ is hydrogen or methyl.
 27. An electronic orelectrical device or component thereof according to any of claims 18 to26, wherein R₉ is hydrogen and R₁₀ is branched or straight chainC₁-C₆alkyl group.
 28. An electronic or electrical device or componentthereof according to claim 27, wherein R₁₀ is methyl.
 29. An electronicor electrical device or component thereof according to any of claims 18to 28, wherein each of R₅ to R₅ is hydrogen.
 30. An electronic orelectrical device or component thereof according to any of claims 18 to29 wherein each of each of R₁, R₂, R₄, and R₅ to R₁₀ is hydrogen, each Xis H, a=0 and c=0.
 31. An electronic or electrical device or componentthereof according to any of claims 24 to 30, wherein the compound offormula I(a) has the following formula:

where n is from 2 to
 10. 32. An electronic or electrical device orcomponent thereof according to any of claims 24 to 30, wherein thecompound of formula I(a) has the following formula:

where n is from 2 to
 10. 33. An electronic or electrical device orcomponent thereof according to claim 31, wherein the compound of formulaI(a) is selected from 1H,1H,2H,2H-perfluorohexyl acrylate (PFAC4),1H,1H,2H,2H-perfluorooctyl acrylate (PFAC6), 1H,1H,2H,2H-perfluorodecylacrylate (PFAC8) and 1H,1H,2H,2H-perfluorododecyl acrylate (PFAC10). 34.An electronic or electrical device or component thereof according toclaim 32, wherein the compound of formula I(a) is selected from1H,1H,2H,2H-pefluorohexyl methacrylate (PFMAC4),1H,1H,2H,2H-perfluorooctyl methacrylate (PFMAC6) and1H,1H,2H,2H-perfluorodecyl methacrylate (PFMAC8).
 35. An electronic orelectrical device or component thereof according to any of claims 18 to23, wherein the compound of formula I(a) has the following formula:

wherein a and c are each independently 0 or 1, b=3-7 and n is 4 to 10,where n=a+b+c+1.
 36. An electronic or electrical device or componentthereof according to any of claims 18 to 23, wherein the compound offormula I(a) has the following formula:

where n is 2 to
 12. 37. An electronic or electrical device or componentthereof according to claim 35 or claim 36, wherein the compound offormula I(a) is selected from ethyl hexyl acrylate, hexyl acrylate,decyl acrylate, lauryl dodecyl acrylate and iso decyl acrylate.
 38. Anelectronic or electrical device or component thereof according to any ofclaims 18 to 23, wherein the monomer is a compound of formula I(b) andhas the following formula:

where n is from 4 to 14, optionally where R₁, R₂ and R₃ are each H. 39.An electronic or electrical device or component thereof according to anyof the preceding claims, wherein the electronic or electrical device orcomponent thereof is selected from mobile phones, smartphones, pagers,radios, sound and audio systems such as loudspeakers, microphones,ringers and/or buzzers, hearing aids, personal audio equipment such aspersonal CD, tape cassette or MP3 players, televisions, DVD playersincluding portable DVD players, video recorders, digi and other set-topboxes, computers and related components such as laptop, notebook,tablet, phablet or palmtop computers, personal digital assistants(PDAs), keyboards, or instrumentation, games consoles, data storagedevices, outdoor lighting systems, radio antennae and other forms ofcommunication equipment, and printed circuit boards.
 40. A method fortreating an electronic or electrical device or component thereofcomprising: exposing the electronic or electrical device or componentthereof to a plasma comprising a monomer compound and a crosslinkingreagent for a period of time sufficient to allow a protectivecross-linked polymeric coating to form on a surface of the electronic orelectrical device or component thereof; wherein the monomer compound hasthe following formula:

where R₁, R₂ and R₄ are each independently selected from hydrogen,optionally substituted branched or straight chain C₁-C₆ alkyl or haloalkyl or aryl optionally substituted by halo, and R₃ is selected from:

where each X is independently selected from hydrogen, optionallysubstituted branched or straight chain C₁-C₆ alkyl, halo alkyl or aryloptionally substituted by halo; and n₁ is an integer from 1 to 27; andwherein the crosslinking reagent comprises two or more unsaturated bondsattached by means of one or more linker moieties and has a boiling pointat standard pressure of less than 500° C.
 41. A method according toclaim 40, wherein the crosslinking reagent has one of the followingstructures:

where Y₁, Y₂, Y₃, Y₄, Y₅, Y₆, Y₇ and Y₈ are each independently selectedfrom hydrogen, optionally substituted cyclic, branched or straight chainC₁-C₆ alkyl or aryl; and L is a linker moiety.
 42. A method according toclaim 41, wherein for compound (i) L has the following formula:

each Y₉ is independently selected from, a bond, —O—, —O—C(O)—, —C(O)—O—,—Y₁₁—O—C(O)—, —C(O)—O—Y₁₁—, —OY₁₁—, and —Y₁₁O—, where Y₁₁ is anoptionally substituted cyclic, branched or straight chain C₁-C₈alkylene; and Y₁₀ is selected from optionally substituted cyclic,branched or straight chain C₁-C₈ alkylene and a siloxane group.
 43. Amethod according to claim 42, wherein for compound (i) L has one of thefollowing structures:


44. A method according to claim 42, wherein for compound (i) L has oneof the following structures:


45. An method according to any of claims 42 to 44, wherein Y₁₀ has thefollowing formula:

wherein each Y₁₂ and Y₁₃ is independently selected from H, halo,optionally substituted cyclic, branched or straight chain alkyl, or—OY₁₄, where Y₁₄ is selected from optionally substituted branched orstraight chain C₁-C₈ alkyl or alkenyl, and n is an integer from 1 to 10.46. A method according to claim 45, wherein each Y₁₂ is H and each Y₁₃is H.
 47. A method according to claim 45, wherein each Y₁₂ is fluoro andeach Y₁₃ is fluoro.
 48. A method according to any of claims 45 to 47,wherein n is from 4 to
 6. 49. A method according to any of claims 42 to44, wherein Y₁₀ has the following formula:

Wherein each Y₁₅ is independently selected from optionally substitutedbranched or straight chain C₁-C₆ alkyl.
 50. A method according to claim49, wherein each Y₁₅ is methyl, and each Y₉ is a bond.
 51. A methodaccording to any of claims 42 to 44, wherein Y₁₀ has the followingformula:

wherein Y₁₆ to Y₁₉ are each independently selected from H and optionallysubstituted branched or straight chain C₁-C₈ alkyl or alkenyl.
 52. Anmethod according to claim 51, wherein Y₁₈ is vinylene or H, and Y₁₆, Y₁₇and Y₁₉ are each H.
 53. A method according to any of claims 40 to 52,wherein the crosslinking reagent is selected from Divinyl Adipate (DVA),1,4 Butanediol divinyl ether (BDVE), 1,4 Cyclohexanedimethanol divinylether (CDDE), 1,7-Octadiene (17OD), 1,2,4-Trivinylcyclohexane (TVCH),1,3-Divinyltetramethyldisiloxane (DVTMDS), Diallyl1,4-cyclohexanedicarboxylate (DCHD), 1,6-Divinylperfluorohexane (DVPFH),1H,1H,6H,6H-Perfluorohexanediol diacrylate (PFHDA) and glyoxal bis(diallyl acetal) (GBDA).
 54. A method according to claim 41, wherein forcompound (ii), L is selected from a branched or straight chain C₁-C₈alkylene or an ether group.
 55. A method according to any of claims 40to 54 wherein the monomer is a compound of formula I(a):

wherein each of R₁, R₂, R₄, and R₅ to R₁₀ is independently selected fromhydrogen or an optionally substituted C₁-C₆ branched or straight chainalkyl group; each X is independently selected from hydrogen or halogen;a is from 0-10; b is from 2 to 14; and c is 0 or 1; ; or wherein themonomer is a compound of formula I(b): I(b)

wherein each of R₁, R₂, R₄, and R₅ to R₁₀ is independently selected fromhydrogen or an optionally substituted C₁-C₆ branched or straight chainalkyl group; each X is independently selected from hydrogen or halogen;a is from 0-10; b is from 2 to 14; and c is 0 or
 1. 56. A methodaccording to claim 55, wherein the halogen is fluorine.
 57. A methodaccording to claim 55 or claim 56, wherein each of R₁, R₂, R₄, and R₅ toR₁₀ is independently selected from hydrogen, methyl, ethyl, n-propyl,isopropyl, n-butyl, isobutyl, tert-butyl, sec-butyl, n-pentyl,neopentyl, n-hexyl, isohexyl, and 3-methylpentyl.
 58. A method accordingto claim 57, wherein each of R₁, R₂, R₄, and R₅ to R₁₀ is independentlyselected from hydrogen or methyl.
 59. A method according to any ofclaims 55 to 58, wherein a and c are each independently 0 or 1; and b isfrom 3 to
 7. 60. A method according to any preceding claim wherein eachX is H.
 61. A method according to any of claims 41 to 59, wherein each Xis F.
 62. A method according to any of claims 41 to 61, wherein R₁ andR₂ are both hydrogen.
 63. A method according to any of claims 41 to 62,wherein R₄ is hydrogen or methyl.
 64. A method according to any ofclaims 41 to 63, wherein R₉ is hydrogen and R₁₀ is branched or straightchain C₁-C₆ alkyl group.
 65. A method according to claim 64, wherein R₁₀is methyl.
 66. A method to any of claims 41 to 65, wherein each of R₅ toR₈ is hydrogen.
 67. A method according to any of claims 41 to 66 whereineach of each of R₁, R₂, R₄, and R₅ to R₁₀ is hydrogen, each X is H, a=0and c=0.
 68. A method according to any of claims 61 to 67, wherein thecompound of formula I(a) has the following formula:

where n is from 2 to
 10. 69. A method according to any of claims 61 to67, wherein the compound of formula I(a) has the following formula:

where n is from 2 to
 10. 70. A method according to claim 68, wherein thecompound of formula I(a) is selected from 1H,1H,2H,2H-perfluorohexylacrylate (PFAC4), 1 H,1 H,2H,2H-perfluorooctyl acrylate (PFAC6),1H,1H,2H,2H-perfluorodecyl acrylate (PFAC8) and1H,1H,2H,2H-perfluorododecyl acrylate (PFAC10).
 71. A method accordingto claim 69, wherein the compound of formula I(a) is selected from1H,1H,2H,2H-pefluorohexyl methacrylate (PFMAC4),1H,1H,2H,2H-perfluorooctyl methacrylate (PFMAC6) and1H,1H,2H,2H-perfluorodecyl methacrylate (PFMAC8).
 72. A method accordingto any of claims 41 to 61, wherein the compound of formula I(a) has thefollowing formula:

wherein a and c are each independently 0 or 1, b=3-7 and n is 4 to 10,where n=a+b+c+1.
 73. A method according to any of claims 41 to 61,wherein the compound of formula I(a) has the following formula:

where n is 2 to
 12. 74. A method according to claim 72 or claim 73,wherein the compound of formula I(a) is selected from ethyl hexylacrylate, hexyl acrylate, decyl acrylate, lauryl dodecyl acrylate andiso decyl acrylate.
 75. A method according to any of claims 41 to 60,wherein the monomer is a compound of formula I(b) and has the followingformula:

where n is from 4 to
 14. 76. A method according to claim 75 wherein themonomer is a compound of formula I(b) and has the following formula:

where n is from 4 to
 14. 77. A method according to any of claims 40 to76 wherein the electronic or electrical device or component thereof isplaced in a plasma deposition chamber, a glow discharge is ignitedwithin said chamber, and a voltage applied as a pulsed field.
 78. Amethod according to claim 77 wherein applied voltage is at a power offrom 40 to 500 W.
 79. A method according to claim 77 or claim 78 whereinthe voltage is pulsed in a sequence in which the ratio of the time on:time off is in the range of from 1:500 to 1:1500.
 80. A method accordingto any of claims 77 to 79 wherein the voltage is pulsed in a sequencewhere power is on for 20-50 μs, and off for from 1000 μs to 30000 μs.81. A method according to any of claims 77 to 80 wherein the voltage isapplied as a pulsed field for a period of from 30 seconds to 90 minutes.82. A method according to claim 81 wherein the voltage is applied as apulsed field for from 5 to 60 minutes.
 83. A method according to any oneof claims 77 to 82, wherein in a preliminary step, a continuous powerplasma is applied to the electronic or electrical device or componentthereof.